Substrate treating apparatus

ABSTRACT

A substrate treating apparatus is disclosed. The apparatus may include a housing including an upper body and a lower body coupled to each other to define a treatment space, the lower body being provided below the upper body, a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space, a fluid supplying unit configured to supply fluid into the treatment space, a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space, and an isolation plate installed between the sealing member and the supporting unit. The isolation plate may be provided to face the sealing member.

CROSS-REFERENCE TO RELATED APPLICATIONS

This U.S. non-provisional patent application claims priority under 35U.S.C. §119 to Korean Patent Application No. 10-2014-0151457, filed onNov. 3, 2015, in the Korean Intellectual Property Office, the entirecontents of which are hereby incorporated by reference.

BACKGROUND OF THE INVENTION

Example embodiments of the inventive concept relate to a substratetreating apparatus, and in particular, to a substrate treating apparatusfor cleaning a substrate.

In general, a semiconductor device is fabricated by performing variousprocesses (e.g., a photolithography process, an etching process, an ionimplantation process, and a deposition process) on a substrate (e.g., asilicon wafer).

In each process, various foreign substances (e.g., particles, organiccontaminants, and metallic impurities) may be produced. The foreignsubstances may lead to process defects in a subsequent process oftreating a substrate and thereby deterioration in performance and yieldof a semiconductor device, and thus, in a process of fabricating asemiconductor device, it is necessary to perform a cleaning process forremoving such foreign substances.

The cleaning process may include a chemical treating process of removingcontaminants from a surface of a substrate using chemicals, a wetcleaning process of removing remaining chemicals from the surface of thesubstrate using pure or de-ionized water, and a drying process ofsupplying dehydration fluid on the surface of the substrate to removeremnants of the pure water.

In the past, the drying process was performed in such a way to supplyheated nitrogen gas on a substrate, on which pure water remains.However, a reduction in line width or an increase in aspect ratio ofpatterns led to a great difficulty in removing the pure water fromnarrow spaces between the patterns. To overcome this problem, in arecent drying process, the remaining pure water on a substrate isreplaced with liquid organic solvent (e.g., isopropyl alcohol) havinghigh volatility and low surface tension, compared with the pure water,and then, heated nitrogen gas is supplied to dry the substrate.

However, there is a difficulty in mixing non-polar organic solvent withpolar water, and thus, in order to replace the pure water with theliquid organic solvent, it is necessary to supply a large amount ofliquid organic solvent onto the substrate for a long time.

Furthermore, although the organic solvent is used for the dryingprocess, for sub-30 nm semiconductor devices, it is difficult to preventa problem of pattern collapse, and thus, a supercritical drying processis being considered as an alternative to the conventional dryingprocess.

FIG. 1 is a diagram schematically illustrating a substrate treatingapparatus 10 configured to perform a supercritical process. Thesubstrate treating apparatus 10 may include a chamber 12, a supportingunit 14, and a sealing member 16. Since the supercritical drying processis performed using a supercritical fluid, the chamber 12 should bemaintained to have a high internal pressure. For this, the chamber 12 isprovided to have a hermetically-sealed structure, and moreover, thesealing member 16 is additionally provided to prevent a leakage pathfrom being formed between the chamber 12 and the outside.

However, in a step (e.g., removing the organic solvent) of thesupercritical drying process, organic solvent may enter in the sealingmember 16 provided in the chamber 12. The entered organic solvent mayserve as a source of particles to be accumulated near the sealing member16.

After the supercritical drying process, the chamber 12 may be opened tounload the substrate S to the outside. At this time, due to a differencein pressure between inner and outer spaces of the chamber 12, theparticles accumulated near the sealing member 16 may be moved into theinner space of the chamber 12. Some of such particles may be depositedon a surface of the substrate S. The particles deposited on thesubstrate S may lead to failures in a subsequent process.

SUMMARY

Example embodiments of the inventive concept provide a substratetreating apparatus, allowing a substrate drying process to be performedwith high efficiency.

Example embodiments of the inventive concept provide a substratetreating apparatus capable of preventing particles, which may beproduced in a substrate drying process, from flowing onto a substrateand thereby improving process efficiency of the substrate dryingprocess.

According to example embodiments of the inventive concept, provided aresubstrate treating apparatuses.

According to example embodiments of the inventive concept, a substratetreating apparatus may include a housing including an upper body and alower body coupled to each other to define a treatment space, the lowerbody being provided below the upper body, a supporting unit coupled tothe upper body, the supporting unit supporting an edge of a substratedisposed in the treatment space, a fluid supplying unit configured tosupply fluid into the treatment space, a sealing member provided betweenand in contact with the upper and lower bodies, the sealing memberhermetically isolating the treatment space from an outer space, and anisolation plate installed between the sealing member and the supportingunit. The isolation plate may be provided to face the sealing member.

In some embodiments, the isolation plate may be provided to have a ringshape.

In some embodiments, the isolation plate may be installed to the upperbody and may have a downwardly protruding structure, whose bottom ispositioned below a top surface of an inner wall of the lower body.

In some embodiments, the supporting unit may include a vertical portiondownwardly extending from the upper body, and a horizontal portioninwardly extending from an end portion of the vertical portion toward aninner region of the housing and supporting a bottom surface of thesubstrate.

In some embodiments, the fluid supplying unit may include an upper fluidsupplying part configured to directly supply the fluid onto a topsurface of the substrate supported by the supporting unit.

In some embodiments, the fluid supplied through the fluid supplying unitmay be a supercritical fluid.

According to example embodiments of the inventive concept, a substratetreating apparatus may include a housing including a lower body defininga treatment space whose top is opened and an upper body coupled to thelower body to veil the treatment space, a supporting unit coupled to theupper body, the supporting unit supporting an edge of a substratedisposed in the treatment space, a fluid supplying unit configured tosupply fluid into the treatment space, and a sealing member providedbetween and in contact with the upper and lower bodies, the sealingmember hermetically isolating the treatment space from an outer space.The upper body may include a protruding portion protruding toward thetreatment space and facing the substrate disposed on the supportingunit, and the protruding portion may be downwardly extended to have abottom positioned below a top surface of an inner wall of the lowerbody.

In some embodiments, the upper body may be provided to include aplurality of recessed regions formed along an edge of the protrudingportion, and the supporting unit may be installed to the recessedregion.

In some embodiments, the supporting unit may include a vertical portiondownwardly extending from the upper body and a horizontal portioninwardly extending from an end portion of the vertical portion toward aninner region of the housing and supporting a bottom surface of thesubstrate.

In some embodiments, the fluid supplying unit may include an upper fluidsupplying part configured to directly supply the fluid onto a topsurface of the substrate supported by the supporting unit.

In some embodiments, the fluid supplied through the fluid supplying unitmay be a supercritical fluid.

According to example embodiments of the inventive concept, a substratetreating apparatus may include a housing including an upper bodydefining a treatment space whose bottom is opened and a lower bodycoupled to a bottom surface of the upper body, a supporting unit coupledto the lower body, the supporting unit supporting an edge of a substratedisposed in the treatment space, a fluid supplying unit configured tosupply fluid into the treatment space, and a sealing member providedbetween and in contact with the upper and lower bodies, the sealingmember hermetically isolating the treatment space from an outer space.The sealing member may be positioned below the supporting unit.

In some embodiments, the supporting unit may include a vertical portionupwardly extending from the lower body and a horizontal portionconnected to the vertical portion to support a bottom surface of thesubstrate.

In some embodiments, the substrate treating apparatus may furtherinclude an exhausting member provided below the supporting unit to facethe substrate disposed on the supporting unit.

In some embodiments, the fluid supplied through the fluid supplying unitmay be a supercritical fluid.

BRIEF DESCRIPTION OF THE DRAWINGS

Example embodiments will be more clearly understood from the followingbrief description taken in conjunction with the accompanying drawings.The accompanying drawings represent non-limiting, example embodiments asdescribed herein.

FIG. 1 is a diagram schematically illustrating a conventional substratetreating apparatus for performing a supercritical process.

FIG. 2 is a plan view illustrating a substrate treating system accordingto example embodiments of the inventive concept.

FIG. 3 is a sectional view illustrating an example of the first processchamber of FIG. 2.

FIG. 4 is a sectional view illustrating an example of the second processchamber of FIG. 2.

FIG. 5 is a sectional view illustrating another example of the secondprocess chamber of FIG. 2.

FIG. 6 is a sectional view illustrating other example of the secondprocess chamber of FIG. 2.

FIG. 7 is a diagram schematically illustrating an aspect of particlemovement which may occur near a sealing member of the second processchamber of FIG. 4.

FIG. 8 is a diagram schematically illustrating an aspect of particlemovement which may occur near a sealing member of the second processchamber of FIG. 5.

FIG. 9 is a diagram schematically illustrating an aspect of particlemovement which may occur near a sealing member of the second processchamber of FIG. 6.

It should be noted that these figures are intended to illustrate thegeneral characteristics of methods, structure and/or materials utilizedin certain example embodiments and to supplement the written descriptionprovided below. These drawings are not, however, to scale and may notprecisely reflect the precise structural or performance characteristicsof any given embodiment, and should not be interpreted as defining orlimiting the range of values or properties encompassed by exampleembodiments. For example, the relative thicknesses and positioning ofmolecules, layers, regions and/or structural elements may be reduced orexaggerated for clarity. The use of similar or identical referencenumbers in the various drawings is intended to indicate the presence ofa similar or identical element or feature.

DETAILED DESCRIPTION

Example embodiments of the inventive concepts will now be described morefully with reference to the accompanying drawings, in which exampleembodiments are shown. Example embodiments of the inventive conceptsmay, however, be embodied in many different forms and should not beconstrued as being limited to the embodiments set forth herein; rather,these embodiments are provided so that this disclosure will be thoroughand complete, and will fully convey the concept of example embodimentsto those of ordinary skill in the art. In the drawings, the thicknessesof layers and regions are exaggerated for clarity. Like referencenumerals in the drawings denote like elements, and thus theirdescription will be omitted.

It will be understood that when an element is referred to as being“connected” or “coupled” to another element, it can be directlyconnected or coupled to the other element or intervening elements may bepresent. In contrast, when an element is referred to as being “directlyconnected” or “directly coupled” to another element, there are nointervening elements present. Like numbers indicate like elementsthroughout. As used herein the term “and/or” includes any and allcombinations of one or more of the associated listed items. Other wordsused to describe the relationship between elements or layers should beinterpreted in a like fashion (e.g., “between” versus “directlybetween,” “adjacent” versus “directly adjacent,” “on” versus “directlyon”).

It will be understood that, although the terms “first”, “second”, etc.may be used herein to describe various elements, components, regions,layers and/or sections, these elements, components, regions, layersand/or sections should not be limited by these terms. These terms areonly used to distinguish one element, component, region, layer orsection from another element, component, region, layer or section. Thus,a first element, component, region, layer or section discussed belowcould be termed a second element, component, region, layer or sectionwithout departing from the teachings of example embodiments.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper” and the like, may be used herein for ease of description todescribe one element or feature's relationship to another element(s) orfeature(s) as illustrated in the figures. It will be understood that thespatially relative terms are intended to encompass differentorientations of the device in use or operation in addition to theorientation depicted in the figures. For example, if the device in thefigures is turned over, elements described as “below” or “beneath” otherelements or features would then be oriented “above” the other elementsor features. Thus, the exemplary term “below” can encompass both anorientation of above and below. The device may be otherwise oriented(rotated 90 degrees or at other orientations) and the spatially relativedescriptors used herein interpreted accordingly.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of exampleembodiments. As used herein, the singular forms “a,” “an” and “the” areintended to include the plural forms as well, unless the context clearlyindicates otherwise. It will be further understood that the terms“comprises”, “comprising”, “includes” and/or “including,” if usedherein, specify the presence of stated features, integers, steps,operations, elements and/or components, but do not preclude the presenceor addition of one or more other features, integers, steps, operations,elements, components and/or groups thereof.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which example embodiments of theinventive concepts belong. It will be further understood that terms,such as those defined in commonly-used dictionaries, should beinterpreted as having a meaning that is consistent with their meaning inthe context of the relevant art and will not be interpreted in anidealized or overly formal sense unless expressly so defined herein.

Hereinafter, a substrate treating system 100 according to exampleembodiments of the inventive concept will be described.

The substrate treating system 100 may be configured to perform asupercritical process of treating a substrate S using a supercriticalfluid as a process fluid.

Here, the substrate S may be one of a variety of substrates, on whichcircuit patterns (for example, for semiconductor devices, flat paneldisplay (FPD) devices, and so forth) can be formed. As an example, thesubstrate S may be a silicon wafer, but example embodiments of theinventive concept may not be limited thereto. For example, varioussubstrates, such as wafers, glass substrates, or organic substrates, maybe used as the substrate S.

The supercritical process may refer to a process, in which supercriticalfluid is used, and may include a supercritical drying process and asupercritical etching process. For the sake of simplicity, thedescription that follows will refer to an example of the supercriticalcleaning process. Example embodiments of the inventive concept may notbe limited to these examples; for example, the substrate treating system100 may be used to perform supercritical processes, other than thesupercritical cleaning process.

The supercritical drying process may be performed in such a way thatorganic solvent remaining between circuit patterns is mixed withsupercritical fluid and then the mixture is removed from the substrateS. The use of the supercritical drying process may make it possible toachieve high efficiency in a substrate drying process and to preventpattern collapse. In the supercritical drying process, at least one ofmaterials having high miscibility with organic solvent may be used asthe supercritical fluid. As an example, supercritical carbon dioxide(scCO₂) may be used as the supercritical fluid.

Hereinafter, some examples of the substrate treating system 100according to example embodiments of the inventive concept will bedescribed with reference to the accompanying drawings. In someembodiments, the substrate treating system 100 may be configured toperform a cleaning process (e.g., including a supercritical dryingprocess).

FIG. 2 is a plan view illustrating a substrate treating system accordingto example embodiments of the inventive concept.

Referring to FIG. 2, the substrate treating system 100 may include anindex module 1000 and a process module 2000.

The index module 1000 may be configured to receive a substrate S fromthe outside and send the substrate S to the process module 2000. In someembodiments, the process module 2000 may be configured to allow asupercritical drying process to be performed therein.

The index module 1000 may serve as an equipment front end module (EFEM)and may include a load port 1100 and a transfer frame 1200.

A carrier C may be provided in the rod port 1100 to contain thesubstrate S. The carrier C may be provided in the form of afront-opening-unified pod (FOUP). The carrier C may be loaded from theoutside to the load port 1100 or may be unloaded from the load port 1100to the outside by an overhead transfer (OHT) system.

The transfer frame 1200 may be configured to allow the substrate S to betransferred between the carrier C loaded on the rod port 1100 and theprocess module 2000. The transfer frame 1200 may include an index robot1210 and an index rail 1220. The index robot 1210 may be configured tomove along the index rail 1220 and carry the substrate S.

The process module 2000 may include a buffer chamber 2100, a transferchamber 2200, a first process chamber 3000, and a second process chamber4000.

The buffer chamber 2100 may be configured to temporarily store thesubstrate S, which will be transferred between the index and processmodules 1000 and 2000. A buffer slot may be provided in the bufferchamber 2100. The substrate S may be disposed in the buffer slot. Forexample, the substrate S may be ejected from the carrier C and may bedisposed in the buffer slot, by the index robot 1210. A transfer robot2210 may be provided in the transfer chamber 2200 to allow the substrateS to be ejected from the buffer slot and then be transferred to thefirst or second process chamber 3000 or 400. In certain embodiments, aplurality of buffer slots may be provided in the buffer chamber 2100,and in this case, a plurality of the substrates S may be disposed in thebuffer slots, respectively, of the buffer chamber 2100.

The transfer chamber 2200 may be configured to allow the substrate S tobe transferred among the buffer chamber 2100, the first process chamber3000, and the second process chamber 4000, which are disposed neartransfer chamber 2200. The transfer chamber 2200 may include thetransfer robot 2210 and a transfer rail 2220. The transfer robot 2210may be configured to move along the transfer rail 2220 and carry thesubstrate S.

At least one of the first and second process chambers 3000 and 4000 maybe configured to perform a cleaning process. For example, the cleaningprocess may be sequentially performed in the first and second processchambers 3000 and 4000. As an example, a chemical process, a rinseprocess, and an organic solvent process constituting the cleaningprocess may be performed in the first process chamber 3000. Asupercritical dry process may be performed in the second process chamber4000.

Each of the first and second process chambers 3000 and 4000 may bedisposed at a side region of the transfer chamber 2200. For example, thefirst and second process chambers 3000 and 4000 may be disposed atopposite sides of the transfer chamber 2200 to face each other.

A plurality of the first process chambers 3000 and a plurality of thesecond process chambers 4000 may be provided in the process module 2000.The process chambers 3000 and 4000 may be disposed to have a lineararrangement at a side region of the transfer chamber 2200, avertically-stacked arrangement, or a vertically-stacked lineararrangement.

The arrangements of the first and second process chambers 3000 and 4000are not limited to these examples and may be variously modified inconsideration of technical issues (e.g., foot-print or processefficiency) associated with the substrate treating system 100.

Hereinafter, some features of the first process chamber 300 will bedescribed in more detail.

FIG. 3 is a sectional view illustrating the first process chamber ofFIG. 2.

The first process chamber 3000 may be configured to perform a chemicalprocess, a rinse process, and an organic solvent process. In certainembodiments, one or some of these processes may be selectively performedin the first process chamber 3000. Here, the chemical process mayinclude supplying a cleaning agent onto the substrate S to removeforeign substances from the substrate S. The rinse process may includesupplying a rinse agent onto the substrate S to remove at least afraction of the cleaning agent remaining on the substrate S. The organicsolvent process may include supplying an organic solvent onto thesubstrate S to replace or substitute the rinse agent remaining betweencircuit patterns of the substrate S with the organic solvent with lowsurface tension.

Referring to FIG. 3, the first process chamber 3000 may include asupporting member 3100, a nozzle member 3200, and a collecting member3300.

The supporting member 3100 may be configured to support the substrate S.The supporting member 3100 may also be configured to rotate thesubstrate S supported thereby. The supporting member 3100 may include asupporting plate 3110, a supporting pin 3111, a chuck pin 3112, arotating axis 3120, and a rotating actuator 3130.

The supporting plate 3110 may have a top surface, whose shape is thesame or similar to that of the substrate S. The supporting pin 3111 andthe chuck pin 3112 may be provided on the top surface of the supportingplate 3110. The supporting pin 3111 may be used to support a bottomsurface of the substrate S. The chuck pin 3112 may be used to fasten thesubstrate S supported by the supporting pin 3111.

The rotating axis 3120 may be connected to a bottom portion of thesupporting plate 3110. The rotating actuator 3130 may be configured torotate the supporting plate 3110 through the rotating axis 3120.Accordingly, the substrate S may be rotated along with the supportingplate 3110. The chuck pin 3112 may prevent the substrate S from beingdeviated from a normal position thereof.

The nozzle member 3200 may be configured to spray treatment solutiononto the substrate S. The nozzle member 3200 may include a nozzle 3210,a nozzle bar 3220, a nozzle axis 3230, and a nozzle axis actuator 3240.

The nozzle 3210 may be configured to spray the treatment solution ontothe substrate S loaded on the supporting plate 3110. The treatmentsolution may be at least one of cleaning agent, rinse agent, or organicsolvent. In some embodiments, the cleaning agent may include hydrogenperoxide (H₂O₂) solution, hydrogen peroxide solution mixed with ammonia(NH₄OH), hydrochloric acid (HCl), or sulfuric acid (H₂SO₄), orhydrofluoric acid (HF) solution. The rinse agent may be pure orde-ionized water. The organic solvent may be provided in the form of atleast one of solution or gas of isopropyl alcohol, ethyl glycol,1-propanol, tetra hydraulic franc, 4-hydroxyl, 4-methyl, 2-pentanone,1-butanol, 2-butanol, methanol, ethanol, n-propyl alcohol, or dimethylethyl.

The nozzle 3210 may be provided on a bottom surface of the nozzle bar3220. The nozzle bar 3220 may be coupled to the nozzle axis 3230. Thenozzle axis 3230 may be configured to be moved in a vertical directionor be rotated by the nozzle axis actuator 3240. The nozzle axis actuator3240 may change a vertical position and/or a rotation angle of thenozzle axis 3230 to adjust a position of the nozzle 3210.

The collecting member 3300 may be configured to retrieve treatmentsolution supplied onto the substrate S. When the treatment solution issupplied onto the substrate S through the nozzle member 3200, thesubstrate S may be rotated by the supporting member 3100, and in thiscase, the whole region of the substrate S may be uniformly covered withthe treatment solution. The rotation of the substrate S may lead to anoutward scattering of the treatment solution. The collecting member 3300may be configured to retrieve a fraction of the treatment solution to bescattered from the substrate S.

For example, the collecting member 3300 may include a collecting barrel3310, a collecting line 3320, a lifting bar 3330, and a lifting actuator3340.

The collecting barrel 3310 may be provided to have a circularring-shaped structure enclosing the supporting plate 3110. In someembodiments, the collecting member 3300 may include a plurality ofcollecting barrels 3310. The collecting barrels 3310 may be provided tohave diameters and heights increasing in a direction away from thesupporting plate 3110, and, when viewed in a plan view, each of thecollecting barrels 3310 may have a ring-shaped structure. The taller thecollecting barrel 3310, the farther it is from the supporting plate3110. A collecting hole 3311 may be formed between the collectingbarrels 3310, and thus, a fraction of the treatment solution to bescattered from the substrate S may be retrieved through the collectinghole 3311.

The collecting line 3320 may be connected to the collecting barrel 3310through a bottom surface of the collecting barrel 3310. The treatmentsolution collected in the collecting barrel 3310 may be supplied to atreatment solution recycling system (not shown) through the collectingline 3320.

The lifting bar 3330 may be connected to the collecting barrel 3310.Power may be transmitted from the lifting actuator 3340 to the liftingbar 3330, and such power may be used to change a vertical position ofthe collecting barrel 3310. In the case where a plurality of thecollecting barrels 3310 are provided, the lifting bar 3330 may beconnected to the outermost one of the collecting barrels 3310. Thelifting actuator 3340 may control the lifting bar 3330 to adjust avertical position of the collecting barrel 3310, and this may make itpossible to allow the scattering fraction of the treatment solution tobe mainly collected through a selected one of the collecting holes 3311.

Hereinafter, technical features associated with the second processchamber 4000 will be described.

The second process chamber 4000 may be configured to perform asupercritical drying process using supercritical fluid. In certainembodiments, the second process chamber 4000 may be configured toperform a supercritical process, other than the supercritical dryingprocess, and moreover, the second process chamber 4000 may be configuredto perform a process using any other process fluid, not using thesupercritical fluid.

Hereinafter, the second process chamber 400 according to exampleembodiments of the inventive concept will be described in more detailwith reference to FIG. 4.

FIG. 4 is a sectional view illustrating an example of the second processchamber of FIG. 2.

Referring to FIG. 4, the second process chamber 4000 may include ahousing 4100, a lifting unit 4200, a supporting unit 4300, a heater4400, a fluid supplying unit 4500, a blocking member 4600, an exhaustingmember 4700, a sealing member 4800, and an isolation plate 4900.

The housing 4100 may provide a treatment space, in which thesupercritical drying process will be performed. The housing 4100 may beformed of a material capable of enduring a higher pressure than thecritical pressure.

The housing 4100 may include an upper body 4110 and a lower body 4120.The lower body 4120 may be coupled to the upper body 4110, below theupper body 4110. A space enclosed by the upper and lower bodies 4110 and4120 may be used as a treatment space for the substrate treatingprocess.

The upper body 4110 may be fixedly attached to an external structure.The lower body 4120 may be configured to be vertically movable withrespect to the upper body 4110. If the lower body 4120 is moved in adownward direction to be spaced apart from the upper body 4110, thetreatment space provided in the second process chamber 4000 may beopened. The substrate S may be inserted into or unloaded from the openedtreatment space of the second process chamber 4000. When the organicsolvent process in the first process chamber 3000 is finished, thesubstrate S is injected into the second process chamber 4000, and thus,the organic solvent may remain on the substrate S to be injected intothe second process chamber 4000. If the lower body 4120 is moved in anupward direction to be in contact with the upper body 4110, thetreatment space in the second process chamber 4000 may be hermeticallyclosed. The supercritical drying process may be performed in the closedtreatment space. In certain embodiments, the housing 4100 may beconfigured in such a way that the lower body 4120 is fixed and the upperbody 4110 is vertically movable.

The lifting unit 4200 may be used to move the lower body 4120 in avertical direction. The lifting unit 4200 may include a lifting cylinder4210 and a lifting rod 4220. The lifting cylinder 4210 may be connectedto the lower body 4120 to allow a vertical driving force to be exertedto the lower body 4120. During the supercritical drying process, themagnitude of the vertical driving force exerted through the liftingcylinder 4210 may be high enough to prevent any leakage path from beingformed between the upper and lower bodies 4110 and 4120 and thereby tohermetically seal the second process chamber 4000, under a high internalpressure (e.g., higher than the critical pressure) of the second processchamber 4000. The lifting rod 4220 may have a vertically-extendedstructure including an end portion inserted into the lifting cylinder4210 and an opposite end portion coupled to the upper body 4110. If thedriving force is exerted to the lifting cylinder 4210, the liftingcylinder 4210 and the lifting rod 4220 may be vertically moved to changea vertical position of the lower body 4120 coupled to the liftingcylinder 4210. When the vertical position of the lower body 4120 ischanged by the lifting cylinder 4210, the lifting rod 4220 may preventthe upper and lower bodies 4110 and 4120 from moving in a horizondirection and may guide the upper and lower bodies 4110 and 4120 alongthe vertical direction; that is, the lifting rod 4220 may prevent theupper and lower bodies 4110 and 4120 from being deviated from theirnormal positions.

The supporting unit 4300 may be provided in the treatment space of thehousing 4100 to support the substrate S. The supporting unit 4300 may becoupled to the upper body 4110. The supporting unit 4300 may include avertical portion 4320 and a horizontal portion 4310.

The vertical portion 4320 may be coupled to the bottom surface of theupper body 4110. The vertical portion 4320 may be provided to extendfrom the upper body 4110 in a downward direction. The vertical portion4320 may include an end portion that is perpendicularly connected to thehorizontal portion 4310. The horizontal portion 4310 may be provided toextend from the end portion of the vertical portion 4320 toward an innerregion of the housing 4100. The substrate S may be disposed on thehorizontal portion 4310. For example, the horizontal portion 4310 may beprovided to support a bottom surface of an edge region of the substrateS.

Since the supporting unit 4300 may be in contact with the edge region ofthe substrate S to support the substrate S, the supercritical dryingprocess may be performed on the entire top surface and most of thebottom surface of the substrate S. Here, in the substrate S, the topsurface may serve as an active surface provided with patterns and thebottom surface may serve as an inactive surface without any pattern.

The supporting unit 4300 may be coupled to the upper body 4110. Thesupporting unit 4300 may be configured to support the substrate S in arelatively stable manner, when the lower body 4120 is moved in thevertical direction.

A level adjusting member 4111 may be disposed in the upper body 4110provided with the supporting unit 4300. The level adjusting member 4111may be configured to adjust a level or horizontality of the upper body4110. The adjustment of the level of the upper body 4110 may make itpossible to adjust a level or horizontality of the substrate S disposedon the supporting unit 4300.

If the substrate S is inclined during the supercritical drying process,the organic solvent remaining on the substrate S may flow down along theinclined surface of the substrate S. In this case, a portion of thesubstrate S may be insufficiently or excessively dried, and this maylead to damage of the substrate S. Since the level of the substrate Scan be controlled by the level adjusting member 4111, it is possible toprevent this technical issue. In the case where the upper body 4110 isvertically movable and the lower body 4120 is fixed or the supportingunit 4300 is installed to the lower body 4120, the level adjustingmember 4111 may be installed to the lower body 4120.

The heater 4400 may be configured to increase an internal temperature ofthe second process chamber 4000. For example, the supercritical fluidsupplied into the second process chamber 4000 may be heated by theheater 4400 to have a predetermined temperature (e.g., higher than acritical temperature), allowing the supercritical fluid to be maintainedin its supercritical phase. In other words, if the temperature of thesupercritical fluid decreases, the heater 4400 may heat the secondprocess chamber 4000 to allow the supercritical fluid to be maintainedin its supercritical phase. The heater 4400 may be buried in a wall ofat least one of the upper and lower bodes 4110 and 4120. The heater 4400may be configured to generate heat using an electric power supplied fromthe outside.

The fluid supplying unit 4500 may be configured to supply fluid to thesecond process chamber 4000. The fluid may be a supercritical fluid. Asan example, the supercritical fluid may be carbon dioxide.

The fluid supplying unit 4500 may include an upper fluid supplying part4510, a lower fluid supplying part 4520, a supplying line 4550, and avalve 4570.

The upper fluid supplying part 4510 may be configured to directly supplythe supercritical fluid onto the top surface of the substrate S. Theupper fluid supplying part 4510 may be connected to the upper body 4110.For example, the upper fluid supplying part 4510 may be connected to aportion of the upper body 4110 facing a center region of the top surfaceof the substrate S.

The lower fluid supplying part 4520 may be configured to supply thesupercritical fluid onto the bottom surface of the substrate S. Thelower fluid supplying part 4520 may be connected to the lower body 4120.For example, the lower fluid supplying part 4520 may be connected to aportion of the lower body 4120 facing a center region of the bottomsurface of the substrate S.

If the supercritical fluid is supplied to the center regions of thesubstrate S through the upper and lower fluid supplying parts 4510 and4520, the supercritical fluid may spread from the center regions towardedge regions of the substrate S, and thus, substantially the entireregion of the substrate S may be uniformly covered with thesupercritical fluid.

The supplying line 4550 may be connected to the upper and lower fluidsupplying parts 4510 and 4520. The supplying line 4550 may be used tosend the supercritical fluid supplied from the outside to the upper andlower fluid supplying parts 4510 and 4520.

The valve 4570 may be installed on the supplying line 4550. The valve4570 may be used to control a flow amount of the supercritical fluid tobe supplied to the upper and lower fluid supplying parts 4510 and 4520.In certain embodiments, a controller (not shown) may be further providedto control a switching operation of the valve 4570, and this may make itpossible to more precisely adjust flow amount or rate of thesupercritical fluid to be supplied in the housing 4100.

The fluid supplying unit 4500 may be controlled in such a way that thesupercritical fluid is firstly supplied into the housing 4100 throughthe lower fluid supplying part 4520. Thereafter, the supercritical fluidmay be supplied into the housing 4100 through the upper fluid supplyingpart 4510. At an initial stage of the supercritical drying process, aninner space of the second process chamber 4000 may have a pressure lowerthan the critical pressure. In this case, the supercritical fluidsupplied into the second process chamber 4000 may be liquefied. Theliquefied fluid may fall to the substrate S by gravity, thereby causingdamage of the substrate S.

To avoid this technical issue, the supercritical fluid may be firstlysupplied through the lower fluid supplying part 4520. For example, thesupercritical fluid may be supplied into the second process chamber 4000through the lower fluid supplying part 4520, until the inner pressure ofthe second process chamber 4000 reaches the critical pressure. If theinner pressure of the second process chamber 4000 becomes higher thanthe critical pressure, the supplying of the supercritical fluid throughthe upper fluid supplying part 4510 may be started. Since thesupercritical fluid is firstly supplied through the lower fluidsupplying part 4520, not through the upper fluid supplying part 4510, itis possible to prevent the supercritical fluid from being liquefied andfalling to the substrate S.

The blocking member 4600 may be configured to prevent the supercriticalfluid supplied through the fluid supplying unit 4500 from being directlysprayed the bottom surface of the substrate S. In some embodiments, theblocking member 4600 may include a blocking plate 4610 and a supporter4620.

The blocking plate 4610 may be positioned in the treatment space of thehousing 4100. The blocking plate 4610 may be disposed between thesupporting unit 4300 and the lower fluid supplying part 4520. Theblocking plate 4610 may be provided in the form of a circular plate. Theblocking plate 4610 may have a radius that is similar to or larger thanthat of the substrate S. The blocking plate 4610 may be positioned belowthe bottom surface of the substrate S disposed on the supporting unit4300, and this may make it possible to prevent the supercritical fluidsupplied through the lower fluid supplying part 4520 from being directlysprayed the bottom surface of the substrate S. In the case where theradius of the blocking plate 4610 is similar to or larger than that ofthe substrate S, it is possible to effectively prevent the supercriticalfluid from being directly sprayed onto the substrate S.

In certain embodiments, the blocking plate 4610 may be provided to havea radius smaller than that of the substrate S. Even in this case, it ispossible to prevent the supercritical fluid from being directly sprayedonto the substrate S. Furthermore, in this case, it is possible tosuppress a reduction in speed of the supercritical fluid and thereby toallow the supercritical fluid to arrive easily to the substrate S. Inother words, in the case where the blocking plate 4610 is provided tohave a smaller radius than the substrate S, the supercritical dryingprocess on the substrate S may be performed with efficiency.

The supporter 4620 may support the blocking plate 4610. The supporter4620 may be provided to support a back side of the blocking plate 4610.The supporter 4620 may be perpendicularly installed on a bottom wall ofthe housing 4100. The supporter 4620 and the blocking plate 4610 may beconnected to each other without any other jointing member; for example,the supporter 4620 may be laid on the blocking plate 4610 by gravity.

In certain embodiments, the supporter 4620 and the blocking plate 4610may be connected to a jointing member (e.g., nut or bolt).Alternatively, the supporter 4620 and the blocking plate 4610 may form asingle body.

The exhausting member 4700 may be configured to exhaust thesupercritical fluid from the second process chamber 4000. The exhaustingmember 4700 may be connected to an exhausting line 4750 to exhaust thesupercritical fluid to the outside. Here, a valve (not shown) may beinstalled on the exhausting member 4700 or the exhausting line 4750 tocontrol an exhausting amount or rate of the supercritical fluid. In someembodiments, the supercritical fluid exhausted through the exhaustingline 4750 may be released into the atmosphere or supplied to asupercritical fluid recycling system (not shown). The exhausting member4700 may be coupled to the lower body 4120.

At a final state of the supercritical drying process, the supercriticalfluid may be exhausted from the second process chamber 4000, and thus,the internal pressure of the second process chamber 4000 may be loweredbelow the critical pressure of the fluid and the fluid may be liquefied.The liquefied supercritical fluid may be exhausted through theexhausting member 4700 of the lower body 4120, by the gravity.

The sealing member 4800 may hermetically seal the treatment space. Thesealing member 4800 may be provided between the upper body 4110 and thelower body 4120 to be in contact with them. In some embodiments, thesealing member 4800 may be provided to have a ring shape; for example,the sealing member 4800 may be an O-ring.

The isolation plate 4900 may be configured to prevent the substrate Sfrom being contaminated by particles. The isolation plate 4900 may becoupled to the upper body 4110. The isolation plate 4900 may be providedto have a ring shape. The isolation plate 4900 may be provided betweenthe sealing member 4800 and the supporting unit 4300. The isolationplate 4900 may be provided to face the sealing member 4800. Theisolation plate 4900 may extend from the upper body 4110 in a downwarddirection. The isolation plate 4900 may have a downwardly-protrudingstructure, whose bottom is positioned at a lower level of a top surface4121 of an inner wall of the lower body 4120.

FIG. 7 is a diagram schematically illustrating an aspect of particlemovement which may occur near a sealing member of the second processchamber of FIG. 4. In FIG. 7, an arrow schematically represents atrajectory of particles in the second process chamber. As shown in FIG.7, particles may be produced during the substrate treating process. Theparticles may result from isopropyl alcohol (IPA). The particle may bedeposited on the sealing member 4800. When an inner pressure of thehousing 4100 is decreased after the supercritical dry process, theparticles may be moved onto the substrate S, due to a difference inpressure between the inner and outer spaces of the housing 4100.

However, according to example embodiments of the inventive concept,since the isolation plate 4900 is provided between the sealing member4800 and the supporting unit 4300, it is possible to reduce the numberof particles moving toward the substrate S after the supercriticaldrying process and thereby to improve efficiency of the substratecleaning process.

FIG. 5 is a sectional view illustrating another example of the secondprocess chamber of FIG. 2.

Referring to FIG. 5, a second process chamber 5000 may include a housing5100, a lifting unit 5200, a supporting unit 5300, a heater 5400, afluid supplying unit 5500, a blocking member 5600, an exhausting member5700, and a sealing member 5800.

In the example embodiments shown in FIG. 5, the lifting unit 5200, thesupporting unit 5300, the heater 5400, the fluid supplying unit 5500,the blocking member 5600, the exhausting member 5700, and the sealingmember 5800 of the second process chamber 5000 may be configured to havesubstantially the same features as the lifting unit 4200, the supportingunit 4300, the heater 4400, the fluid supplying unit 4500, the blockingmember 4600, the exhausting member 4700, and the sealing member 4800 ofthe second process chamber 4000 described with reference to FIG. 4.

The housing 5100 may provide a treatment space, in which thesupercritical drying process will be performed. The housing 5100 may beformed of a material capable of enduring a higher pressure than thecritical pressure.

The housing 5100 may include an upper body 5110 and a lower body 5120.The lower body 5120 may be configured to provide a space whose top isopened. The upper body 5110 may be coupled to an upper portion of thelower body 5120. The upper body 5110 may be provided to cover the lowerbody 5120. A space enclosed by the upper and lower bodies 5110 and 5120may be used as a treatment space for the substrate treating process.

The upper body 5110 may be installed in a fixed manner. The lower body5120 may be configured to be movable in a vertical direction. If thelower body 5120 is moved in a downward direction to be spaced apart fromthe upper body 5110, the treatment space provided in the second processchamber 5000 may be opened. The substrate S may be inserted into orunloaded from the opened treatment space of the second process chamber5000. When the organic solvent process in the first process chamber 3000is finished, the substrate S is injected into the second process chamber5000, and thus, the organic solvent may remain on the substrate S to beinjected into the second process chamber 5000. If the lower body 5120 ismoved in an upward direction to be in contact with the upper body 5110,the treatment space in the second process chamber 5000 may behermetically closed. The supercritical drying process may be performedin the closed treatment space. In certain embodiments, the housing 5100may be configured in such a way that the lower body 5120 is fixed andthe upper body 5110 is vertically movable.

The upper body 5110 may be provided to include a protruding portion 5130and a recessed region 5150. The protruding portion 5130 may have adownwardly protruding structure. The protruding portion 5130 may beprovided to face the substrate S laid on the supporting unit 5300. Theprotruding portion 5130 may extend to have a bottom positioned at alower level than a top surface 5121 of an inner wall of the lower body5120. The protruding portion 5130 may prevent particles from moving ontothe substrate S.

The recessed region 5150 may be formed along an edge of the protrudingportion 5130. In certain embodiments, the upper body 5110 may beprovided to include a plurality of the recessed regions 5150. Thesupporting unit 5300 may be provided in the recessed region 5150. Thesealing member 5800 may be provided to be adjacent to the recessedregion 5150.

FIG. 8 is a diagram schematically illustrating an aspect of particlemovement which may occur near a sealing member of the second processchamber of FIG. 5. In FIG. 8, an arrow schematically represents atrajectory of particles in the second process chamber. As shown in FIG.8, particles may be produced during the substrate treating process. Theparticle may be deposited on the sealing member 5800. When an innerpressure of the housing 5100 is decreased after the supercritical dryprocess, the particles may be moved onto the substrate S, due to adifference in pressure between the inner and outer spaces of the housing5100.

However, according to example embodiments of the inventive concept,since the upper body 5110 includes the protruding portion 5130 and therecessed region 5150, it is possible to reduce the number of particlesmoving toward the substrate S and thereby to improve efficiency of thesubstrate cleaning process.

FIG. 6 is a sectional view illustrating other example of the secondprocess chamber of FIG. 2.

Referring to FIG. 6, a second process chamber 6000 may include a housing6100, a lifting unit 6200, a supporting unit 6300, a heater 6400, afluid supplying unit 6500, a blocking member 6600, an exhausting member6700, and a sealing member 6800.

In example embodiments shown in FIG. 6, the housing 6100, the liftingunit 6200, the heater 6400, the fluid supplying unit 6500, and theblocking member 6600 of the second process chamber 6000 may beconfigured to have substantially the same features as the housing 4100,the lifting unit 4200, the heater 4400, the fluid supplying unit 4500,and the blocking member 4600 of the second process chamber 4000described with reference to FIG. 4.

The supporting unit 6300 may be provided in the treatment space of thehousing 6100 to support the substrate S. The supporting unit 6300 may becoupled to a lower body 6120. The supporting unit 6300 may include avertical portion 6320 and a horizontal portion 6310.

The vertical portion 6320 may be installed on a bottom wall of the lowerbody 6120. The vertical portion 6320 may be provided to have a structureupwardly extending from the lower body 6120. The vertical portion 6320may include an end portion that is perpendicularly connected to thehorizontal portion 6310. The horizontal portion 6310 may be provided toextend from the end portion of the vertical portion 6320 toward an outerregion of the housing 6100. The substrate S may be disposed on thehorizontal portion 6310. The horizontal portion 6310 may support abottom surface of an edge region of the substrate S.

Since the supporting unit 6300 may be in contact with the edge region ofthe substrate S to support the substrate S, the supercritical dryingprocess may be performed on the entire top surface and most of thebottom surface of the substrate S. Here, in the substrate S, the topsurface may serve as an active surface provided with patterns and thebottom surface may serve as an inactive surface without any pattern.

The exhausting member 6700 may be provided below the supporting unit6300. The exhausting member 6700 may be provided to face the substrate Slaid on the supporting unit 6300. In some embodiments, the exhaustingmember 6700 may be formed to pass through the lower body 6120. At afinal state of the supercritical drying process, the supercritical fluidmay be exhausted from the second process chamber 6000, and thus, theinternal pressure of the second process chamber 6000 may be loweredbelow the critical pressure of the fluid, and in this case, the fluidmay be liquefied. The liquefied supercritical fluid may be exhaustedthrough the exhausting member 6700 of the lower body 6120, by thegravity.

The sealing member 6800 may hermetically isolate the treatment spacefrom the outer space. The sealing member 6800 may be provided between anupper body 6110 and the lower body 6120 to be in contact with them. Thesealing member 6800 may be positioned at a level that is substantiallylower than the supporting unit 6300. In some embodiments, the sealingmember 6800 may be provided to have a ring shape; for example, thesealing member 6800 may be an O-ring.

FIG. 9 is a diagram schematically illustrating an aspect of particlemovement which may occur near a sealing member of the second processchamber of FIG. 6. In FIG. 9, an arrow schematically represents atrajectory of particles in the second process chamber. As shown in FIG.9, particles may be produced during the substrate treating process. Theparticle may be deposited on the sealing member 6800. When an innerpressure of the housing 6100 is decreased after the supercritical dryprocess, the particles may be moved into the treatment space, due to adifference in pressure between the inner and outer spaces of the housing6100.

However, according to example embodiments of the inventive concept,since the sealing member 6800 is positioned below the supporting unit6300, it is possible to reduce the number of particles moving toward thesubstrate S and thereby to improve efficiency of the substrate cleaningprocess.

According to example embodiments of the inventive concept, it ispossible to improve process efficiency in a process of drying asubstrate using supercritical fluid.

According to example embodiments of the inventive concept, it ispossible to suppress particles, which are produced near a sealing memberin a process of drying a substrate using supercritical fluid, fromflowing onto a substrate.

While example embodiments of the inventive concepts have beenparticularly shown and described, it will be understood by one ofordinary skill in the art that variations in form and detail may be madetherein without departing from the spirit and scope of the attachedclaims.

What is claimed is:
 1. A substrate treating apparatus, comprising: ahousing including an upper body and a lower body coupled to each otherto define a treatment space, the lower body being provided below theupper body; a supporting unit coupled to the upper body, the supportingunit supporting an edge of a substrate disposed in the treatment space;a fluid supplying unit configured to supply fluid into the treatmentspace; a sealing member provided between and in contact with the upperand lower bodies, the sealing member hermetically isolating thetreatment space from an outer space; and an isolation plate installedbetween the sealing member and the supporting unit, wherein theisolation plate is provided to face the sealing member.
 2. The substratetreating apparatus of claim 1, wherein the isolation plate is providedto have a ring shape.
 3. The substrate treating apparatus of claim 2,wherein the isolation plate is installed to the upper body and has adownwardly protruding structure, whose bottom is positioned below a topsurface of an inner wall of the lower body.
 4. The substrate treatingapparatus of claim 2, wherein the supporting unit comprises: a verticalportion downwardly extending from the upper body; and a horizontalportion inwardly extending from an end portion of the vertical portiontoward an inner region of the housing and supporting a bottom surface ofthe substrate.
 5. The substrate treating apparatus of claim 2, whereinthe fluid supplying unit comprises an upper fluid supplying partconfigured to directly supply the fluid onto a top surface of thesubstrate supported by the supporting unit.
 6. The substrate treatingapparatus of claim 1, wherein the fluid supplied through the fluidsupplying unit is a supercritical fluid.
 7. A substrate treatingapparatus, comprising: a housing including a lower body defining atreatment space whose top is opened and an upper body coupled to thelower body to veil the treatment space; a supporting unit coupled to theupper body, the supporting unit supporting an edge of a substratedisposed in the treatment space; a fluid supplying unit configured tosupply fluid into the treatment space; and a sealing member providedbetween and in contact with the upper and lower bodies, the sealingmember hermetically isolating the treatment space from an outer space,wherein the upper body comprises a protruding portion protruding towardthe treatment space and facing the substrate disposed on the supportingunit, and the protruding portion is downwardly extended to have a bottompositioned below a top surface of an inner wall of the lower body. 8.The substrate treating apparatus of claim 7, wherein the upper body isprovided to include a plurality of recessed regions formed along an edgeof the protruding portion, and the supporting unit is installed to therecessed region.
 9. The substrate treating apparatus of claim 8, whereinthe supporting unit comprises: a vertical portion downwardly extendingfrom the upper body; and a horizontal portion inwardly extending from anend portion of the vertical portion toward an inner region of thehousing and supporting a bottom surface of the substrate.
 10. Thesubstrate treating apparatus of claim 8, wherein the fluid supplyingunit comprises an upper fluid supplying part configured to directlysupply the fluid onto a top surface of the substrate supported by thesupporting unit.
 11. The substrate treating apparatus of claim 7,wherein the fluid supplied through the fluid supplying unit is asupercritical fluid.
 12. A substrate treating apparatus, comprising: ahousing including an upper body defining a treatment space whose bottomis opened and a lower body coupled to a bottom surface of the upperbody; a supporting unit coupled to the lower body, the supporting unitsupporting an edge of a substrate disposed in the treatment space; afluid supplying unit configured to supply fluid into the treatmentspace; and a sealing member provided between and in contact with theupper and lower bodies, the sealing member hermetically isolating thetreatment space from an outer space, wherein the sealing member ispositioned below the supporting unit.
 13. The substrate treatingapparatus of claim 12, wherein the supporting unit comprises: a verticalportion upwardly extending from the lower body; and a horizontal portionconnected to the vertical portion to support a bottom surface of thesubstrate.
 14. The substrate treating apparatus of claim 13, furthercomprising an exhausting member provided below the supporting unit toface the substrate disposed on the supporting unit.
 15. The substratetreating apparatus of claim 12, wherein the fluid supplied through thefluid supplying unit is a supercritical fluid.